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Wet Etching Equipment - List of Manufacturers, Suppliers, Companies and Products

Wet Etching Equipment Product List

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[Analysis Case] Removal of Organic Contaminants by Etching

[Analysis Case] Removal of Organic Contaminants by Etching

We will remove surface contamination and conduct an evaluation using XPS.

XPS is a surface-sensitive technique, so carbon derived from organic contaminants due to the atmosphere is detected at a significant level. Reducing the influence of this carbon from organic contaminants is important for evaluating the original composition of the film. Typically, Ar ion sputtering is used to remove organic contaminants, but damage caused by sputtering may prevent the evaluation of the film's original composition and bonding states. We present an example where the influence of carbon from organic contaminants was reduced by removing the surface oxide layer using wet etching instead of Ar ion sputtering.

  • Contract Analysis

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Wet etching device "BATCHSPRAY Autoload"

Wet etching device "BATCHSPRAY Autoload"

100% focus on BATCHSPRAY technology! Significantly reduces water, exhaust, and chemicals [Wet chemical equipment for the semiconductor industry] Fully automated system.

This two-chamber system not only provides excellent etching uniformity but also reduces chemical usage. It accommodates all types of wet etching processes. It includes high-precision mixing of chemicals in the tank, endpoint detection (EPD), and a patented retainer comb processing system. Furthermore, SicOzone resist stripping can be applied in the same chamber, enhancing flexibility and reducing processing steps. 【Features】 ■ Throughput of up to 300 wph ■ For wet etching, resist stripping, and cleaning processes ■ Two process chambers ■ Uniformity with less than 1% variation ■ Installation area of less than 12 m² ■ Chemical recycling and reuse through a tank system ■ Capable of processing SiC/GaN *For more details, please refer to the PDF document or feel free to contact us.

  • Other semiconductor manufacturing equipment

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BATCHSPRAY Acid/Clean Autoload

BATCHSPRAY Acid/Clean Autoload

100% focus on BATCHSPRAY technology! Significantly reduce water, exhaust, and chemicals [Wet chemical equipment for the semiconductor industry].

This 3-chamber system utilizes a patented retainer comb processing system, accommodating all types of wet etching processes and cleaning applications. The combination of acid/cleaning allows for high process flexibility and high throughput. By using SicOzone instead of peroxides or sulfuric acid for sustainable processes such as cleaning and resist stripping, it can reduce the consumption of chemicals and deionized water by up to 90%. 【Features】 ■ Throughput of up to 400 wph ■ Two cleaning process chambers ■ Uniformity with less than 1% variation ■ Installation area of less than 12 m² ■ Chemical recirculation through a tank system ■ EPD - End Point Detection *For more details, please download the catalog or feel free to contact us.

  • Other semiconductor manufacturing equipment

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Fundamental and Fine Processing Correspondence in Wet Etching and Development of Advanced Material Applications

Fundamental and Fine Processing Correspondence in Wet Etching and Development of Advanced Material Applications

What is the cutting-edge etching for the formation of transparent electrode patterns for next-generation power device substrates, touch panels, and fine-pitch electronic components?!

**Lecturer** Mr. Kimihiko Ikeda, Head of the Implementation Materials Research Laboratory, Electronic Materials Development Research Institute, Research and Development Division, ADEKA Corporation **Target Audience** Engineers, researchers, and beginners interested in wet processes and wet etching technology **Venue** Tokyo Chuo Ward Industrial Hall, 4th Floor, Meeting Room 4 [Tokyo, Nihonbashi] 5 minutes from B4 exit via underground passage from Bakuroyokoyama Station on the Toei Shinjuku Line (Directions 2) 5 minutes from C1 exit via East Exit ticket gate from Bakurocho Station on the JR Sobu Rapid Line (Directions 3) **Date and Time** December 26, 2011 (Monday) 13:30-16:30 **Capacity** 20 participants. *Registration will close once full. Please apply early.* **Participation Fee** **[Early Bird Discount Price]** 46,200 yen (tax included, including text costs) for up to 2 participants from one company. *Limited to Tech-Zone members who apply by December 12. Membership registration is free.* *After December 12, the [Regular Price] will be 49,350 yen (tax included, including text costs) for up to 2 participants from one company.*

  • Company：AndTech
  • Price：10,000 yen-100,000 yen
  • Technical Seminar

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